Prototype Business
Tianma Japan offers high reliability and quality products that utilizes own LCD manufacturing capability/know-hows, provides various type of film deposition, patterning and glass cutting, and can be a partner who can cooperate in the development of new technologies and new products in material, processing, machine manufacturers and research institutes.
Feature of prototype
• Integrated process (deposition, patterning, cutting) |
• Maximum size of glass:550x660mm and thickness of glass:0.5mm or 0.7mm |
• Various metal materials, inorganic insulating film materials, and organic insulating film materials are available |
• Support small-quantity level trial production to mass production. |
• Mounting IC, assembling FPC to glass are an option. Please let us know. |
• Support design such as CAD works. |
• Reliability test is an option. Please let us know. |
• Measurement such as thickness of layer for samples is an option. Please let us know. |
• Support the production of products not only LCD and the contract processing of prototypes using LCD manufacturing technology, equipment, and know-how. |
Available process
■Substrate processing
Process |
Equipment |
Remarks |
|
Available array |
Purchased item |
550x660mm 0.5t/0.7t |
|
Cleaning |
UV/Chemical/Brush/High pressure/Ultrasonic/Pure water |
||
Deposition |
Metal |
Sputter |
AlNd, MoNb, ITO, Cr, Cu, etc. |
Insulator (inorganic) |
P-CVD |
SiNx, SiOx, etc. |
|
Insulator (organic) |
Spin coater |
Acrylic resin (incl. for PS), Polyimide resin |
|
Semiconductor |
P-CVD, Sputter |
a-Si, InGaZnO₄ |
|
Patterning Photolithography |
Coating resist |
Spin coater |
|
Exposure
*Tianma Japan can support design |
Aligner |
Processing ability≥4μm |
|
Stepper |
Processing ability≥4μm |
||
Proximity |
Processing ability≥8μm |
||
Development |
Development |
||
Etching |
Dry etching |
SiOx、SiNx、Cr |
|
Wet etching |
AlNd、MoNb、ITO、Cu、Ag |
||
Stripping |
Amine based treatment |
||
High temperature annealing(bake) |
Hot air circulation |
O2 concentration can be adjusted by N2 |
CVD equipment slot | CVD equipment | ITO sputter |
Photolithography equipment slot | Stepper | Dry etching equipment |
Table1:Deposition material, Thickness, Line width, Resistance
Below is available type of material, thickness.
|
Type |
Thickness |
Minimum line width / Spacing(μm) |
Ratio value |
Remark |
Wiring/ |
AL alloy |
30~500 |
4/5 |
5 |
With Mo Alloy lamination |
Mo alloy |
30~300 |
4/4.5 |
16 |
||
ITO (Transparent conductive) |
40~150 |
4/5 |
165~800 |
||
Cr |
30~50 |
4/4 |
20 |
||
Cu |
30~200 |
4/9 |
3 |
Thickness, line width and spacing is just guideline.
Measurement such as thickness of layer for samples is an option. Please let us know.
Table2:Material, Thickness, Line width
|
Type |
Thickness |
Minimum line width / Spacing(μm) |
Remark |
Insulator |
SiNx |
50~1000 |
5 |
Contact hole formation available |
SiOx |
50~200 |
5 |
||
Acrylic resin |
1500~25000 |
10 |
||
Polyimide resin |
100~10000 |
10 |
||
a-Si |
10~250 |
5 |
|
|
InGaZnO₄ |
30~200 |
5 |
Thickness, line width and spacing is just guideline. If you have request, please let us know.
Measurement such as thickness of layer for samples is an option. Please let us know.
■Post-process
Available contents |
Equipment |
Remark |
Sealing |
Dispensing |
Seal width:0.5~2mm level |
ODF |
ODF equipment |
Alignment level:±6μm (370x470mm glass size only) |
Thermosetting Seal material |
Hot air circulation |
|
Slimming |
Chemical etching(outsource) |
Up to 0.2t on one side |
Cutting |
Regular cutting machine Free form cutting machine |
・tolerance:±0.3mm ・Please ask the cutting size and free form shape. |
Polishing edge |
Polishing machine | |
Cleaning |
Neutral detergent & Pure water cleaning |
■Bonding
Available contents |
Equipment |
Remark |
Bonding |
Film bonding device machine |
Available size (middle size) Available size (large size) |
Sensor & Touch panel bonding |
Includes vacuum bonding UV curing treatment by OCR |
Available size 87x142~325x490mm |
OCA bonding |
||
Touch panel bonding to LCD module |
Includes vacuum bonding UV curing treatment by OCR |
|
OCA bonding |
||
Adhesive bonding |
Film bonding device machine | Vacuum bonding equipment |
Case of product 1: LCD materials evaluation
Tianma Japan offers the substrate for evaluation of Liquid Cristal , Polyimide materials.
Case of product 2: OLED materials evaluation
Tianma Japan Sample image |
Offering the substrate for OLED materials.
Case of product 3: ACF material evaluation
Tianma Japan supports test samples for evaluation ACF materials.